Growth of ~5 cm2V-1s-1 mobility, p-type Copper(I) oxide (Cu2O) films by fast atmospheric atomic layer deposition (AALD) at 225°C and below (2012)

First Author: Muñoz-Rojas D
Attributed to:  Printed Logic Supply Chain (FlexIC) - TSB App. No. 155 funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1063/1.4771681

Publication URI: http://dx.doi.org/10.1063/1.4771681

Type: Journal Article/Review

Parent Publication: AIP Advances

Issue: 4