Material sensitive scanning probe microscopy of subsurface semiconductor nanostructures via beam exit Ar ion polishing. (2011)
Abstract
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Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1088/0957-4484/22/18/185702
PubMed Identifier: 21415470
Publication URI: http://europepmc.org/abstract/MED/21415470
Type: Journal Article/Review
Volume: 22
Parent Publication: Nanotechnology
Issue: 18
ISSN: 0957-4484