The evolution of the plasma potential in a HiPIMS discharge and its relationship to deposition rate (2010)
Abstract
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Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1088/0963-0252/19/4/045014
Publication URI: http://dx.doi.org/10.1088/0963-0252/19/4/045014
Type: Journal Article/Review
Parent Publication: Plasma Sources Science and Technology
Issue: 4