Chemically amplified fullerene resists, spin-on fullerene hardmasks and high aspect ratio etching (2012)

First Author: Frommhold A
Attributed to:  Next Generation Resist Technology for the Semiconductor Industry funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1109/nano.2012.6322209

Publication URI: http://dx.doi.org/10.1109/nano.2012.6322209

Type: Conference/Paper/Proceeding/Abstract

ISBN: 978-1-4673-2198-3