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Long-Range Lateral Dopant Diffusion in Tungsten Silicide Layers (2009)

First Author: Liao S

Attributed to: Conduit Diffusion in Silicon on Silicide on Insulator substrates funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1109/tsm.2008.2010734

Publication URI: http://dx.doi.org/10.1109/tsm.2008.2010734

Type: Journal Article/Review

Parent Publication: IEEE Transactions on Semiconductor Manufacturing

Issue: 1