Long-Range Lateral Dopant Diffusion in Tungsten Silicide Layers (2009)

First Author: Liao S
Attributed to:  Conduit Diffusion in Silicon on Silicide on Insulator substrates funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1109/tsm.2008.2010734

Publication URI: http://dx.doi.org/10.1109/tsm.2008.2010734

Type: Journal Article/Review

Parent Publication: IEEE Transactions on Semiconductor Manufacturing

Issue: 1