Fabrication of submicron-sized features in InP/InGaAsP/AlGaInAs quantum well heterostructures by optimized inductively coupled plasma etching with Cl2/Ar/N2 chemistry (2010)

First Author: Dylewicz R


No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1116/1.3466811

Publication URI: http://dx.doi.org/10.1116/1.3466811

Type: Journal Article/Review

Parent Publication: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Issue: 4