Positive-tone chemically amplified fullerene resist (2012)

First Author: Manyam J
Attributed to:  Next Generation Resist Technology for the Semiconductor Industry funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1117/12.916472

Publication URI: http://dx.doi.org/10.1117/12.916472

Type: Conference/Paper/Proceeding/Abstract