Positive-tone chemically amplified fullerene resist (2012)
Attributed to:
Next Generation Resist Technology for the Semiconductor Industry
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1117/12.916472
Publication URI: http://dx.doi.org/10.1117/12.916472
Type: Conference/Paper/Proceeding/Abstract