Effect of an Oxide Cap Layer and Fluorine Implantation on the Metal-Induced Lateral Crystallization of Amorphous Silicon (2012)
Abstract
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Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1149/2.038301jss
Publication URI: http://dx.doi.org/10.1149/2.038301jss
Type: Journal Article/Review
Parent Publication: ECS Journal of Solid State Science and Technology
Issue: 1