Determining the electronic performance limitations in top-down-fabricated Si nanowires with mean widths down to 4 nm. (2014)

First Author: Mirza MM

Attributed to: Evolvable Process Design (EPD) funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1021/nl5015298

PubMed Identifier: 25299791

Publication URI: http://europepmc.org/abstract/MED/25299791

Type: Journal Article/Review

Volume: 14

Parent Publication: Nano letters

Issue: 11

ISSN: 1530-6984