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Deep reactive ion etching of silicon moulds for the fabrication of diamond x-ray focusing lenses (2013)

First Author: Malik A

Attributed to: Molecular beam mass spectrometry of microwave activated plasmas used in diamond chemical vapour deposition funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1088/0960-1317/23/12/125018

Publication URI: http://dx.doi.org/10.1088/0960-1317/23/12/125018

Type: Journal Article/Review

Parent Publication: Journal of Micromechanics and Microengineering

Issue: 12