Deep reactive ion etching of silicon moulds for the fabrication of diamond x-ray focusing lenses (2013)
Attributed to:
Molecular beam mass spectrometry of microwave activated plasmas used in diamond chemical vapour deposition
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1088/0960-1317/23/12/125018
Publication URI: http://dx.doi.org/10.1088/0960-1317/23/12/125018
Type: Journal Article/Review
Parent Publication: Journal of Micromechanics and Microengineering
Issue: 12