Atmospheric pressure chemical vapour deposition of vanadium arsenide thin films via the reaction of VCl4 or VOCl3 with tBuAsH2 (2013)
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Abstract
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Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.tsf.2013.04.144
Publication URI: http://dx.doi.org/10.1016/j.tsf.2013.04.144
Type: Journal Article/Review
Parent Publication: Thin Solid Films