Tantalum and Titanium doped In 2 O 3 Thin Films by Aerosol-Assisted Chemical Vapor Deposition and their Gas Sensing Properties (2012)
Attributed to:
Molecular Precursors for the CVD of Gallium and Indium Oxides
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1021/cm300596c
Publication URI: http://dx.doi.org/10.1021/cm300596c
Type: Journal Article/Review
Parent Publication: Chemistry of Materials
Issue: 15