Exploring the plasma chemistry in microwave chemical vapor deposition of diamond from C/H/O gas mixtures. (2012)
Attributed to:
Experiment and modelling of the growth of CVD diamond: towards a detailed understanding of growth chemistry and mechanisms
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1021/jp306190n
PubMed Identifier: 22924542
Publication URI: http://europepmc.org/abstract/MED/22924542
Type: Journal Article/Review
Volume: 116
Parent Publication: The journal of physical chemistry. A
Issue: 38
ISSN: 1089-5639