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Exploring the plasma chemistry in microwave chemical vapor deposition of diamond from C/H/O gas mixtures. (2012)

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1021/jp306190n

PubMed Identifier: 22924542

Publication URI: http://europepmc.org/abstract/MED/22924542

Type: Journal Article/Review

Volume: 116

Parent Publication: The journal of physical chemistry. A

Issue: 38

ISSN: 1089-5639