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Effect of deposition conditions and post deposition anneal on reactively sputtered titanium nitride thin films (2015)

First Author: Ponon N

Attributed to: Ferroelectrics for Nanoelectronics (FERN) funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.tsf.2015.02.009

Publication URI: http://dx.doi.org/10.1016/j.tsf.2015.02.009

Type: Journal Article/Review

Parent Publication: Thin Solid Films