Ion Track Nanolithography Using Thick Cross-Linked Poly(methyl methacrylate) 950 Photoresist (2010)
Attributed to:
Highly-efficient thermoelectric power harvesting
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1143/jjap.49.06ge07
Publication URI: http://dx.doi.org/10.1143/jjap.49.06ge07
Type: Journal Article/Review
Parent Publication: Japanese Journal of Applied Physics
Issue: 6S