The effects of film surface roughness on x-ray diffraction of nonpolar gallium nitride films (2009)
Attributed to:
Defect reduction in GaN using the in-situ growth of transition metal nitride layers
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1088/0022-3727/42/13/135407
Publication URI: http://dx.doi.org/10.1088/0022-3727/42/13/135407
Type: Journal Article/Review
Parent Publication: Journal of Physics D: Applied Physics
Issue: 13