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Oxide and chalcogenide MOCVD (metal-organic chemical vapour deposition)

Lead Research Organisation: Swansea University
Department Name: College of Engineering

Abstract

The history of II-VI metal-organic chemical vapour deposition (MOCVD) goes back as far as IIII-V MOCVD but has not had the traction in applications for lasers, LEDs and high frequency devices that has been experienced by III-V semiconductors. A new generation of MOCVD equipment can more fully exploit the potential of II-VI semiconductors and explore new oxides and chalcogenides in the exiting areas of III-VIs such as Ga2O3 and 2-D semiconductors such as MoS2. There is now a compelling case for the UK to have state-of-the-art MOCVD equipment for compound semiconductors (CS) covering oxide and chalcogenide materials that are not covered by existing centres such as the National Epitaxy Facility at Sheffield, Cambridge and UCL, and Institute of CS at Cardiff. The UK has a golden opportunity to build on our strengths in CS research that will drive innovation across a range of new opto-electronic and power electronic devices. The need arises from a new generation of functional compound semiconductor materials to capture the unique properties of oxide and chalcogenide compound semiconductors (CSs), complementing III-V compounds and silicon, and opening new application areas in optoelectronics, energy and healthcare.
It is proposed that we buy the Aixtron Close Couple Showerhead (CCS) reactor that has been proven to be the reactor design of choice for GaN deposition and will be the ideal equipment to deposit high quality oxide and chalcogenide compound semiconductor materials. "The UK needs this facility, which it does not have at present. Swansea is an excellent place for it." - Prof. Sir Colin Humphreys (Cambridge). "This proposed research facility will perfectly complement the installation of ~100 production MOCVD reactors leveraged by a £375M investment by IQE Plc over 2018-2022" - Dr Wyn Meredith (CSC, Cardiff). The CCS reactor will be installed in a new building for the Centre for Integrated Semiconductor Materials (CISM) (due for completion in Q1 2021) on the Swansea University Bay Campus. Over 140 m2 of specialist materials laboratory space will be allocated to the MOCVD reactor and complementary materials and characterisation equipment from Professor Irvine's laboratory. This new laboratory will be managed by Professor Irvine's team to provide high quality oxide and chalcogenide CSs to our research partners in Swansea University, other UK universities, industrial partners and to international collaborators. This will put the UK at the forefront of new science and technology using oxide and chalcogenide CSs for applications including high efficiency photovoltaic solar cells, Light harvesting quantum wire opto-electronic devices, piezoelectric energy harvesting, high breakdown voltage power electronic devices and light emitters. This new science and technology will benefit EPSRC priorities of "21st Century Products" and "Sustainable Industries" through enabling smart new products that could be rapidly prototyped through well proven manufacturing capability for MOCVD in the UK and enabling the application of more sustainable materials and reduced materials usage. This exciting opportunity is detailed in the case for support.

Planned Impact

In addition to the extensive academic stakeholders who will gain access to the MOCVD reactor, there is significant industry interest to take advantage of new developments in oxide and chalcogenide compound semiconductors. The new equipment will be located at the Swansea University Bay Campus where the £90m joint university-industry centre for integrative semiconductor materials (CISM) will be located and linked to the South Wales cluster in compound semiconductors which is driven by the world leading supplier of epitaxial wafers, IQE. The equipment will enable the compound semiconductor cluster to take advantage of developments in new compound semiconductor materials. The preferred manufacturer, Aixtron Ltd have expressed interest in a collaborative R&D programme for this equipment at Swansea to enable development of new materials based on ZnO, MoS2 and Ga2O3. The Swansea team have also established strong international links with companies such as First Solar in the USA where this MOCVD equipment will be essential to further our collaboration on high performance thin film solar cells. We also have significant opportunities with the application of thin film PV materials for ultra-light-weight solar cells for space where we have worked with SSTL and this MOCVD reactor will enable demonstration of higher performance tandem solar cells that will be needed for eventual deployment.
The rapidly growing industrial cluster in compound semiconductors will require a new generation of MOCVD scientists and engineers and the Aixtron CCS MOCVD reactor will provide an excellent training ground because there will be no established recipes, but PhD students and post-doctoral research staff will need to understand the fundamental processes of MOCVD to produce device quality material.
We expect the impact of this equipment to go far beyond the immediate stakeholders and to inspire a new generation in the exciting opportunities in STEM subjects. We will work with professional institutes such as the RSC, IOP and IOM3, with their STEM ambassadors' schemes for outreach to schools across the UK. Publicity material will be produced to explain the exciting properties and opportunities with these new materials and the fascinating science behind the MOCVD process. This outreach will extend to many local communities to raise awareness of world class opportunities on their doorstep. Outreach opportunities exist with The Swansea Festival of Science and the National Eisteddfod where Swansea University have a major exhibition each year and provides a platform to reach a much wider audience.

Publications

10 25 50
 
Description The state-of-the-art Oxide and Chalcogenide Metalorganic Chemical Vapor Deposition (MOCVD) Facility is fully operational, ushering in a new era of cutting-edge materials research. Housed within the Centre for Integrative Semiconductor Materials (CISM), this world-class facility is powered by an EPSRC Strategic Equipment-funded Close Coupled Showerhead MOCVD system from AIXTRON, installed in a purpose-built laboratory designed for pioneering semiconductor advancements.
This versatile and high-precision MOCVD system enables the controlled deposition of semiconductor thin films onto either 3 x 2" or 1 x 4" substrates, specializing in both metal oxides and chalcogenides-critical materials driving next-generation electronics, photonics, and energy applications. Gallium oxide thin films, known for their ultrawide bandgap and high breakdown voltage, are revolutionizing next-generation power electronics, deep-UV photodetectors, and high-efficiency semiconductor devices, offering unprecedented performance in extreme environments. Chalcogenides, composed of sulphur, selenium, or tellurium combined with metals, offer unique electrical and optical properties essential for photovoltaics, optoelectronics, and 2D materials research.
Already, the facility has successfully deposited gallium and zinc oxide on sapphire substrates, the 2D material tungsten disulfide, and the high-performance photovoltaic material cadmium telluride. With these early successes, the laboratory is set to push boundaries in semiconductor research, advanced sensors, and energy-efficient devices.
Led by Dr. Dan Lamb, Swansea's Oxide and Chalcogenide MOCVD Facility welcomes collaborations with research institutes and industry partners seeking to explore new material properties, enhance device performance, and accelerate the transition from research to real-world applications.
Exploitation Route Collaborative Research and Development: The facility invites partnerships with academic institutions and industry players to explore and develop advanced semiconductor materials. By providing access to state-of-the-art MOCVD technology, collaborators can investigate new material properties, enhance device performance, and accelerate the transition from research to commercial applications. This collaborative environment fosters innovation in electronics, photonics, and energy sectors.

Prototyping and Process Development: Industry partners can utilize the facility for prototyping and refining manufacturing processes. The controlled deposition capabilities of the MOCVD system enable precise fabrication of semiconductor thin films, essential for developing next-generation devices. This resource supports companies in bringing innovative products to market more efficiently.

Training and Skill Development: The facility serves as a training ground for researchers and engineers, offering hands-on experience with cutting-edge MOCVD equipment. This exposure helps cultivate a skilled workforce proficient in advanced semiconductor fabrication techniques, addressing the growing demand for expertise in this critical field.

Access to Advanced Characterization Tools: Collaborators gain access to comprehensive materials characterization and analysis tools, including microscopy, surface analysis, and electrical measurements. These resources are vital for understanding material properties and optimizing device performance, thereby enhancing the quality and reliability of semiconductor products.
Sectors Digital/Communication/Information Technologies (including Software)

Electronics

Energy

Environment

Manufacturing

including Industrial Biotechology

Transport

 
Description After two months of operation, our new equipment shows promising results, indicating that our key findings will be widely utilized. We have secured funding for collaborative research projects with various institutes, which are set to commence soon. Additionally, we have initiated industrial engagement and are currently developing a comprehensive scope of work. A journal paper detailing the results of the initial series of MOCVD experiments conducted with this equipment is also in preparation.
First Year Of Impact 2024
 
Description Doped Emitters to Unlock Lowest Cost Solar Electricity
Amount £484,145 (GBP)
Funding ID EP/W000555/1 
Organisation Engineering and Physical Sciences Research Council (EPSRC) 
Sector Public
Country United Kingdom
Start 07/2021 
End 07/2024
 
Description First Solar 
Organisation First Solar, Inc
Country United States 
Sector Private 
PI Contribution Providing data on novel doped emitters in CdSeTe solar cells and materials characterisation.
Collaborator Contribution Using First Solar solar cell fabrication on novel doped emitters to evaluate performance.
Impact Creating metal saturated growth in MOCVD for CdTe solar cells, S.J.C. Irvine a, O. Oklobia a, S. Jones a, D.A. Lamb a, G. Kartopu b, D. Lu c, G. Xiong c, Centre for Solar Energy Research, Faculty of Science & Engineering, Swansea University, OpTIC Centre, St. Asaph Business Park, LL17 0JD, UK b Department of Mathematics, Physics and Electrical Engineering, Northumbria University, Newcastle upon Tyne NE1 8ST, UK c First Solar, Inc., 1035 Walsh Ave., Santa Clara, CA 95050, USA Journal of Crystal Growth Volume 607, 1 April 2023, 127124
Start Year 2022
 
Description Loughborough University, CREST 
Organisation Loughborough University
Department Centre for Renewable Energy Systems Technology (CREST)
Country United Kingdom 
Sector Academic/University 
PI Contribution Joint proposal where Loughborough CREST will produce new doped emitters that will be tested using doped absorber layers produced by Swansea University, CSER.
Collaborator Contribution Materials characterisation and physical vapour deposition of doped oxides.
Impact Project at early stage of collaboration.
Start Year 2021
 
Description Loughborough University, CREST 
Organisation Loughborough University
Department Centre for Renewable Energy Systems Technology (CREST)
Country United Kingdom 
Sector Academic/University 
PI Contribution Joint proposal where Loughborough CREST will produce new doped emitters that will be tested using doped absorber layers produced by Swansea University, CSER.
Collaborator Contribution Materials characterisation and physical vapour deposition of doped oxides.
Impact Project at early stage of collaboration.
Start Year 2021
 
Description Tantalum Carbide training program 
Organisation Advanced Furnace Technology
Country United Kingdom 
Sector Private 
PI Contribution Develop and deliver a training program for MOCVD. Included 9 MOCVD lectures, questions and tutorial, hands on with basic principles of MOCVD equipment
Collaborator Contribution Partner devised the project and provided details of their own CVD system into the training project
Impact 4 research staff trained in principles of MOCVD
Start Year 2023
 
Description One day event 
Form Of Engagement Activity Participation in an activity, workshop or similar
Part Of Official Scheme? No
Geographic Reach National
Primary Audience Industry/Business
Results and Impact One day event on thin film materials. Delivered a presentation on the capabilities of the Oxide and Chalcogenide MOCVD system
Year(s) Of Engagement Activity 2023
 
Description Two day workshop on photovoltaics 
Form Of Engagement Activity Participation in an activity, workshop or similar
Part Of Official Scheme? No
Geographic Reach Local
Primary Audience Postgraduate students
Results and Impact Two day workshop discussing Swansea and Imperial College photovoltaic activities. Delivered a 20 minute presentation on chalcogenide MOCVD PV
Year(s) Of Engagement Activity 2023
 
Description Visit to my institute 
Form Of Engagement Activity Participation in an open day or visit at my research institution
Part Of Official Scheme? No
Geographic Reach National
Primary Audience Industry/Business
Results and Impact A days meeting with 4 visitors from a key industrial company. Presenting, discussing and touring of MOCVD facility .
Year(s) Of Engagement Activity 2024